"Good tools are essential to do good work." --The Analects




MBE

Molecular beam epitaxy (MBE)
MBE is an ultra high vacuum technique for the epitaxial (layer by layer) deposition of thin films. It is naturally compatible with many surface science techniques like ARPES, STM/STS. We use this technique for the growth of very high purity transition metal dichalcogenides where the thickness of layers can be controlled with sub monolayer precision.



MBE + spin-ARPES

Spin-,angle-resolved photoemission spectroscopy (Spin-ARPES)
ARPES is also called "microscope of band structure". And Spin-ARPES is the only experimental tool that can directly probe the spin information of band structure of materials. We have developed novel Spin-ARPES system ultilizing spin-exchange interaction which allows us to perform experiments with high energy, momentum resolution, and data collection efficiency.




We also perform ARPES experiments in worldwide synchrotron facilities

National Synchrotron Radiation Laboratory in Hefei
Shanghai Synchrotron Radiation Facility
Advanced light source in Lawrence Berekeley National Lab